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Nanoimprint : A tool for realizing nano-bio researchCARLBERG, P; JOHANSSON, F; MAXIMOV, I et al.IEEE conference on nanotechnology. 2004, pp 199-200, isbn 0-7803-8536-5, 1Vol, 2 p.Conference Paper

Nanoimprint lithography techniques : an introductionSCHEER, H.-C.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810N.1-62810N.10, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

There are NO fundamental limits to optical nanolithographyBRUECK, S. R. J.Lasers and Electro-optics Society. 2004, isbn 0-7803-8557-8, 2Vol, Vol1, 63-64Conference Paper

Nanoscale materials patterning and engineering by atomic force microscopy nanolithographyXIE, X. N; CHUNG, H. J; SOW, C. H et al.Materials science & engineering. R, Reports. 2006, Vol 54, Num 1-2, pp 1-48, issn 0927-796X, 48 p.Article

Holographic nanolithography techniques for the fabrication of microcavity arraysKIM, Jeonghoi; KIM, Changsu; HAN, Haewook et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 63523T.1-63523T.4, issn 0277-786X, isbn 0-8194-6447-3, 2VolConference Paper

Engineered Carbon Nanotubes and Graphene for Nanoelectronics and NanomechanicsYANG, E. H.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7679, issn 0277-786X, isbn 978-0-8194-8143-6, 767902.1-767902.11Conference Paper

An assessment of the process capabilities of nanoimprint lithographyBALLA, Tobias; SPEARING, S. Mark; MONK, Andrew et al.Journal of physics. D, Applied physics (Print). 2008, Vol 41, Num 17, issn 0022-3727, 174001.1-174001.10Conference Paper

Plasmonics (nanoimaging, nanofabrication, and their applications III)Kawata, Satoshi; Shalaev, Vladimir M; Tsai, Din P et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6790-4, 1 v. (various pagings), isbn 978-0-8194-6790-4Conference Proceedings

Plasmonics : Merging photonics and electronics at nanoscale dimensionsOZBAY, Ekmel.Science (Washington, D.C.). 2006, Vol 311, Num 5758, pp 189-193, issn 0036-8075, 5 p.Article

Development of Two-dimensional Scanning Probe Arrays for Dip-pen Nanolithography (DPN)JUN ZOU; XUEFENG WAN; BULLEN, David et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62230N.1-62230N.10, issn 0277-786X, isbn 0-8194-6279-9, 1VolConference Paper

Modeling Nanoscale Ink Transport in Dip pen Nanolithography<^TM>NAFDAY, Omkar A; VAUGHN, Mark W; HAAHEIM, Jason et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 6959, pp 69591B.1-69591B.8, issn 0277-786X, isbn 978-0-8194-7150-5 0-8194-7150-XConference Paper

Fabrication of a microfluidic device for simultaneous patterning of multiple chemical species by Dip Pen Nanolithography (DPN<^TM>)RIVAS-CARDONA, J. Alberto; BANERJEE, Debjyoti.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62230K.1-62230K.9, issn 0277-786X, isbn 0-8194-6279-9, 1VolConference Paper

Step and Flash Imprint Lithography for Semiconductor High Volume Manufacturing?MALLOY, M; LITT, L. C.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 763706.1-763706.11Conference Paper

Site-Specific Dual Ink Dip Pen Nanolithography^™NAFDAY, Omkar A; HAAHEIM, Jason R; VILLAGRAN, Fredy et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7318, issn 0277-786X, isbn 978-0-8194-7584-8 0-8194-7584-X, 1Vol, 73180A.1-73180A.7Conference Paper

Challenges of residual layer minimisation in thermal nanoimprint lithographyBOGDANSKI, Nicolas; WISSEN, Matthias; MBLLÖNBCCK, Saskia et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65330Q.1-65330Q.6, issn 0277-786X, isbn 978-0-8194-6655-6Conference Paper

Polarization-selective subwavelength grating used with 193 nm lightKANG GUO GUO; TAN QIAO FENG; JIN GUO FAN et al.Optics communications. 2010, Vol 283, Num 22, pp 4531-4535, issn 0030-4018, 5 p.Article

Fabrication of 50 nm period gratings with multilevel interference lithographyCHANG, Chih-Hao; ZHAO, Y; HEILMANN, R. K et al.Optics letters. 2008, Vol 33, Num 14, pp 1572-1574, issn 0146-9592, 3 p.Article

Metastable-atom-stimulated desorption from dodecanethiolate self-assembled monolayersYAMAUCHI, Y; NORO, T; KURAHASHI, M et al.Applied surface science. 2005, Vol 241, Num 1-2, pp 141-145, issn 0169-4332, 5 p.Conference Paper

Near-field optical lithography method for fabrication of the nanodimensional objectsDRYAKHLUSHIN, V. F; KLIMOV, A. Yu; ROGOV, V. V et al.Applied surface science. 2005, Vol 248, Num 1-4, pp 200-203, issn 0169-4332, 4 p.Conference Paper

Diffraction gratings for generating varying-period interference patterns of surface plasmonsBEZUS, E. A; BYKOV, D. A; DOSKOLOVICH, L. L et al.Journal of optics. A, Pure and applied optics (Print). 2008, Vol 10, Num 9, issn 1464-4258, 095204.1-095204.5Article

Direct observation of deformation of nafion surfaces induced by methanol treatment by using atomic force microscopyUMEMURA, Kazuo; KURODA, Reiko; YANFENG GAO et al.Applied surface science. 2008, Vol 254, Num 23, pp 7980-7984, issn 0169-4332, 5 p.Conference Paper

One nanometer structure fabrication using electron beam induced depositionVAN DORP, W. F; HAGEN, C. W; CROZIER, P. A et al.Microelectronic engineering. 2006, Vol 83, Num 4-9, pp 1468-1470, issn 0167-9317, 3 p.Conference Paper

Towards Nanowriting on Plastics: Dip-Pen Nanolithography of Acrylamido-Functionalized Oligonucleotides on PolystyreneTURRI, Stefano; TORLAJ, Luca; LEVI, Marinella et al.Macromolecular rapid communications. 2010, Vol 31, Num 15, pp 1373-1377, issn 1022-1336, 5 p.Article

Fabrication for metal photomask pattern by using fountain-pen nanolithographyONOUE, Miki; USHIJIMA, Hirobumi.Microelectronic engineering. 2010, Vol 87, Num 5-8, pp 910-913, issn 0167-9317, 4 p.Conference Paper